Credits: 3 (3-0-0)
Description
Course Introduction, Modern Semiconductor IC fabrication Industrial/ Academic Landscape; Overview of modern CMOS process flow – basic steps; Crystal growth and wafer basics; Cleanroom basics – environment, infrastructure, advanced MOS cleaning, getering etc.
Lithography; Oxidation; Diffusion; Ion-Implantation; Thin-Film Deposition; Etching; Backend processes; Process Simulation- tools, techniques and methods; Advanced device fabrication concepts – I (SOI, FDSOI, etc); Advanced device fabrication concepts – II (organic, PV, hetero); Advanced device fabrication concepts – III (CNTs, Self-assembly etc).